Oxygen_Plasma_Cleaning.JPG
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Summary
| Description |
English:
The surface of a MEMS device is cleaned with bright, blue Oxygen Plasma in a Plasma Etcher to rid it of carbon contaminants. (100mTorr, 50W RF)
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| Date | |
| Source | Own work |
| Author | Maxfisch |
Maboudian Lab, UC Berkeley
Licensing
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This file is made available under the Creative Commons CC0 1.0 Universal Public Domain Dedication . |
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The person who associated a work with this deed has dedicated the work to the
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by waiving all of their rights to the work worldwide under copyright law, including all related and neighboring rights, to the extent allowed by law. You can copy, modify, distribute and perform the work, even for commercial purposes, all without asking permission.
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