Pulsed_Laser_Deposition_in_Action.jpg
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Summary
| Description |
English:
Thin films of oxides are deposited with atomic layer precision using pulsed laser deposition. A high-intensity pulsed laser is shooting onto the rotating white target consisting of Al
2
O
3
(alumina). The laser pulse creates a plasma explosion visible as the purple cloud. The plasma cloud expands towards the square substrate, consisting of SrTiO
3
(strontium titanate), where it deposits thin layers of alumina, one atomic layer at a time. This results in a conducting interface between the two materials which are otherwise insulating. The substrate is mounted on a heating plate, glowing red from a temperature of 650 ºC, to improve the crystallinity of the alumina thin film.
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| Date | |
| Source | Own work |
| Author | Adam Andersen Læssøe |
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This image was uploaded as part of European Science Photo Competition 2015 . |